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Hybrid PVD System

Introduction
Hybrid PVD system operates based on both cathodic arc and sputtering processes. In cathodic arc deposition, an electric arc is used to vaporize material from a target, while in sputtering atoms are ejected from a target as a result of the bombardment of the target by high energy particles. Then the vaporized/ejected material condenses on a substrate, forming a thin film. Hybrid PVD is widely used to synthesize extremely hard films to protect the surface of cutting tools and extend their life remarkably. 

Application
Deposition of hard thin films, super hard coatings and nanocomposite coatings, including TiN, TiAlN, CrN, ZrN, AlCrTiN and TiAlSiN.
 
Certificates and standards
  • Certificate of Nanotechnology

Nanotechnology in Product

A wide variety of hard thin films, super hard nanostructured coatings and nanocomposite coatings can be synthesized by Hybrid PVD system.

Hybrid PVD

Contact Us

  • Office address: 2nd floor, No 30, East 26th St., Azadegan Blvd, Sheikh Bahaei Avenue., Tehran, Iran
  • Tel: (+98) 21 88354398
  • Fax: (+98) 21 88359623
  • Email: info@iliahightech.com